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Oberflchenanalytische Charakterisierung von metallischen Verunreinigungen und Oxiden auf GaAs
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Inhalt dieses Buches ist die detaillierte Charakterisierung der Oberflche von GaAs-Halbleitern hinsichtlich oberflchennaher Verunreinigungen und passivierender Oxidschichten. Der Autor entwickelt ein Verfahren zum quantitativen Nachweis von metallischen Spurenelementen mit der Flugzeit-Sekundrionenmassenspektrometrie (TOF-SIMS), das es mglich macht, Oberflchenbelegungen auf GaAs mit Konzentrationen kleiner 109 Atome/cm2 quantitativ nachzuweisen. Ein Vergleich passivierender Oxide hinsichtlich ihrer Komponenten, Schichtstruktur und Dicke liefert die Grundlagen fr gezielte nderungen des Herstellungsprozesses.
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