Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

Name: Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Brand: Springer Nature
SKU: 9784431547945
Availability: InStock

Best Price:
Buy Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System for $39.99 at @ Link.springer.com
No coupon is required — this is the standard retail price.

Set a price drop alert to never miss an offer.

1 Offer Price Range: $39.99 - $39.99

BEST PRICE

Single Product Purchase

$39.99

@ Link.springer.com BUY Now

Price Comparison

Seller	Contact Seller	List Price	On Sale	Shipping	Best Promo	Final Price	Volume Discount	Financing	Availability	Seller's Page
BEST PRICE 1 Product Purchase @ Link.springer.com		$39.99	$39.99			$39.99		See Site	In stock	Visit Store

Product Details

Brand

Springer Nature

Manufacturer

N/A

Part Number

GTIN

9784431547945

Condition

New

Product Description

This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.

Available Colors

N/A

Available Sizes

N/A